Researchers have now found a way to make nuclear clocks a thousand times less radioactive and more cost-effective, thanks to a method creating thin films of thorium tetrafluoride (ThF4).

Solid-state clock Illustration of how thorium atoms are vaporized (bottom) and then deposited in a thin film on the substrate’s surface (middle). This film could form the basis for a nuclear clock ...

This updated version of the popular handbook further explains all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through ...

What Are Sputtering Targets?Sputtering targets are the source materials for the preparation of sputtered thin films. In particular, high-purity sputtering targets are used in the physical vapor ...

While both Physical Vapor Deposition (PVD) and CVD are used for creating thin films and coatings, their methodologies, applications, and the properties of the resulting films can vary significantly.

The energy or heat source may be a plasma, substrate induction, or resistance heater. Physical Vapor Deposition (PVD) Physical vapor deposition processes form thin film layers through evaporation or ...

The physical vapor deposition (PVD) equipment market is forecasted to grow by USD 4.52 billion during 2023-2028, accelerating at a CAGR of 11% during the forecast period. This report on the ...

PVD techniques, such as sputtering and thermal evaporation ... CVD techniques, such as plasma-enhanced CVD (PECVD) and low-pressure CVD (LPCVD), enable the deposition of high-quality, conformal films ...